Electrical stability study of metal/dielectric systems

dc.rights.license	Restricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributor	Lu, T.-M. (Toh-Ming), 1943-
dc.contributor	Bakhru, Hassaram
dc.contributor	Bhat, Ishwara B.
dc.contributor	Lewis, Kim M.
dc.contributor	Nayak, Saroj K.
dc.contributor.author	Ou, Ya
dc.date.accessioned	2021-11-03T09:42:33Z
dc.date.available	2021-11-03T09:42:33Z
dc.date.created	2010-01-19T11:11:30Z
dc.date.issued	2009-12
dc.identifier.uri	https://hdl.handle.net/20.500.13015/2893
dc.description	December 2009
dc.description	School of Science
dc.description	Center for Integrated Electronics
dc.language.iso	ENG
dc.publisher	Rensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartof	Rensselaer Theses and Dissertations Online Collection
dc.subject	Physics
dc.title	Electrical stability study of metal/dielectric systems
dc.type	Electronic thesis
dc.type	Thesis
dc.digitool.pid	20950
dc.digitool.pid	20951
dc.digitool.pid	20953
dc.digitool.pid	20952
dc.digitool.pid	20954
dc.rights.holder	This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degree	PhD
dc.relation.department	Dept. of Physics, Applied Physics, and Astronomy

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