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dc.rights.licenseRestricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributorManiatty, Antoinette M.
dc.contributorChow, T. Paul
dc.contributorPicu, Catalin R.
dc.contributorZhang, Lucy T.
dc.contributor.authorGe, Youzhang
dc.date.accessioned2021-11-03T09:54:51Z
dc.date.available2021-11-03T09:54:51Z
dc.date.created2010-06-08T08:29:13Z
dc.date.issued2010-05
dc.identifier.urihttps://hdl.handle.net/20.500.13015/3023
dc.descriptionMay 2010
dc.descriptionSchool of Engineering
dc.language.isoENG
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.subjectMechanical engineering
dc.titleNumerical study of electromigration in passivated interconnects
dc.typeElectronic thesis
dc.typeThesis
dc.digitool.pid23277
dc.digitool.pid23278
dc.digitool.pid23280
dc.digitool.pid23279
dc.digitool.pid23281
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degreePhD
dc.relation.departmentDept. of Mechanical, Aerospace, and Nuclear Engineering


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