Numerical study of electromigration in passivated interconnects

dc.rights.license	Restricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributor	Maniatty, Antoinette M.
dc.contributor	Chow, T. Paul
dc.contributor	Picu, Catalin R.
dc.contributor	Zhang, Lucy T.
dc.contributor.author	Ge, Youzhang
dc.date.accessioned	2021-11-03T09:54:51Z
dc.date.available	2021-11-03T09:54:51Z
dc.date.created	2010-06-08T08:29:13Z
dc.date.issued	2010-05
dc.identifier.uri	https://hdl.handle.net/20.500.13015/3023
dc.description	May 2010
dc.description	School of Engineering
dc.language.iso	ENG
dc.publisher	Rensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartof	Rensselaer Theses and Dissertations Online Collection
dc.subject	Mechanical engineering
dc.title	Numerical study of electromigration in passivated interconnects
dc.type	Electronic thesis
dc.type	Thesis
dc.digitool.pid	23277
dc.digitool.pid	23278
dc.digitool.pid	23280
dc.digitool.pid	23279
dc.digitool.pid	23281
dc.rights.holder	This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degree	PhD
dc.relation.department	Dept. of Mechanical, Aerospace, and Nuclear Engineering

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