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dc.rights.licenseCC BY-NC-ND. Users may download and share copies with attribution in accordance with a Creative Commons Attribution-Noncommercial-No Derivative Works 3.0 License. No commercial use or derivatives are permitted without the explicit approval of the author.
dc.contributorChrisey, Douglas B.
dc.contributorGall, Daniel
dc.contributorWang, G.-C. (Gwo-Ching), 1946-
dc.contributorShi, Yunfeng
dc.contributor.authorYan, Zijie
dc.date.accessioned2021-11-03T10:11:41Z
dc.date.available2021-11-03T10:11:41Z
dc.date.created2011-06-28T10:13:02Z
dc.date.issued2011-05
dc.identifier.urihttps://hdl.handle.net/20.500.13015/3297
dc.descriptionMay 2011
dc.descriptionSchool of Engineering
dc.language.isoENG
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.rightsAttribution-NonCommercial-NoDerivs 3.0 United States*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/us/*
dc.subjectMaterials engineering
dc.titleParticle generation by pulsed excimer laser ablation in liquid: hollow structures and laser-induced reactions
dc.typeElectronic thesis
dc.typeThesis
dc.digitool.pid29396
dc.digitool.pid29401
dc.digitool.pid29398
dc.digitool.pid29399
dc.digitool.pid29403
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degreePhD
dc.relation.departmentDept. of Materials Science and Engineering


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CC BY-NC-ND. Users may download and share copies with attribution in accordance with a Creative Commons Attribution-Noncommercial-No Derivative Works 3.0 License. No commercial use or derivatives are permitted without the explicit approval of the author.
Except where otherwise noted, this item's license is described as CC BY-NC-ND. Users may download and share copies with attribution in accordance with a Creative Commons Attribution-Noncommercial-No Derivative Works 3.0 License. No commercial use or derivatives are permitted without the explicit approval of the author.