Thermal and electrical stability of metal/porous low-k dielectric interfaces

dc.rights.license	Restricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Libraries.
dc.contributor	Lu, T.-M. (Toh-Ming), 1943-
dc.contributor	Bakhru, Hassaram
dc.contributor	Bhat, Ishwara B.
dc.contributor	Lewis, Kim M.
dc.contributor	Nayak, Saroj K.
dc.contributor.author	He, Ming
dc.date.accessioned	2021-11-03T10:13:42Z
dc.date.available	2021-11-03T10:13:42Z
dc.date.created	2011-09-06T11:28:19Z
dc.date.issued	2011-08
dc.identifier.uri	https://hdl.handle.net/20.500.13015/3334
dc.description	August 2011
dc.description	School of Science
dc.description	Center for Integrated Electronics
dc.language.iso	ENG
dc.publisher	Rensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartof	Rensselaer Theses and Dissertations Online Collection
dc.subject	Physics
dc.title	Thermal and electrical stability of metal/porous low-k dielectric interfaces
dc.type	Electronic thesis
dc.type	Thesis
dc.digitool.pid	30376
dc.digitool.pid	30377
dc.digitool.pid	30379
dc.digitool.pid	30378
dc.digitool.pid	30380
dc.rights.holder	This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degree	PhD
dc.relation.department	Dept. of Physics, Applied Physics, and Astronomy

RPI Theses Online (Complete)
Rensselaer theses from 2006; many restricted to current RPI Students, Faculty and Staff