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dc.rights.licenseRestricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributorLu, T.-M. (Toh-Ming), 1943-
dc.contributorBakhru, Hassaram
dc.contributorPlawsky, Joel L., 1957-
dc.contributorKane, Ravi S.
dc.contributorBhat, Ishwara B.
dc.contributor.authorJuneja, Jasbir S.
dc.date.accessioned2021-11-03T10:39:55Z
dc.date.available2021-11-03T10:39:55Z
dc.date.created2007-05-21T19:30:49Z
dc.date.issued2006-12
dc.identifier.urihttps://hdl.handle.net/20.500.13015/3736
dc.descriptionDecember 2006
dc.descriptionSchool of Engineering
dc.language.isoENG
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.subjectChemical and biological engineering
dc.titleCVD Parylene-N as pore sealant for porous low-κ dielectrics
dc.typeElectronic thesis
dc.typeThesis
dc.digitool.pid5369
dc.digitool.pid5370
dc.digitool.pid5372
dc.digitool.pid5371
dc.digitool.pid5373
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degreePhD
dc.relation.departmentDept. of Chemical and Biological Engineering


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