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    Physical-chemical interactions at metal/low-k dielectric interfaces

    Author
    Achanta, Ravi S.
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    9665_ThesisRaviAchanta.pdf (1.155Mb)
    9666_AbstractRaviAchanta.pdf (59.46Kb)
    Other Contributors
    Plawsky, Joel L., 1957-; Gill, William N.; Martin, Lealon L.; Gall, Daniel; Borca-Tasçiuc, Theodorian;
    Date Issued
    2008-05
    Subject
    Chemical and biological engineering
    Degree
    PhD;
    Terms of Use
    This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.;
    Metadata
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    URI
    https://hdl.handle.net/20.500.13015/4044
    Abstract
    Description
    May 2008; School of Engineering
    Department
    Dept. of Chemical and Biological Engineering;
    Publisher
    Rensselaer Polytechnic Institute, Troy, NY
    Relationships
    Rensselaer Theses and Dissertations Online Collection;
    Access
    Restricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.;
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    • RPI Theses Online (Complete)

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