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dc.rights.licenseRestricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributorPlawsky, Joel L., 1957-
dc.contributorGill, William N.
dc.contributorMartin, Lealon L.
dc.contributorGall, Daniel
dc.contributorBorca-Tasçiuc, Theodorian
dc.contributor.authorAchanta, Ravi S.
dc.date.accessioned2021-11-03T10:53:10Z
dc.date.available2021-11-03T10:53:10Z
dc.date.created2008-01-18T11:10:53Z
dc.date.issued2008-05
dc.identifier.urihttps://hdl.handle.net/20.500.13015/4044
dc.descriptionMay 2008
dc.descriptionSchool of Engineering
dc.language.isoENG
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.subjectChemical and biological engineering
dc.titlePhysical-chemical interactions at metal/low-k dielectric interfaces
dc.typeElectronic thesis
dc.typeThesis
dc.digitool.pid9664
dc.digitool.pid9665
dc.digitool.pid9667
dc.digitool.pid9666
dc.digitool.pid9668
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degreePhD
dc.relation.departmentDept. of Chemical and Biological Engineering


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