Physical-chemical interactions at metal/low-k dielectric interfaces

Authors
Achanta, Ravi S.
ORCID
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Other Contributors
Plawsky, Joel L., 1957-
Gill, William N.
Martin, Lealon L.
Gall, Daniel
Borca-Tasçiuc, Theodorian
Issue Date
2008-05
Keywords
Chemical and biological engineering
Degree
PhD
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This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
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Abstract
Description
May 2008
School of Engineering
Department
Dept. of Chemical and Biological Engineering
Publisher
Rensselaer Polytechnic Institute, Troy, NY
Relationships
Rensselaer Theses and Dissertations Online Collection
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