Physical-chemical interactions at metal/low-k dielectric interfaces

dc.rights.license	Restricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributor	Plawsky, Joel L., 1957-
dc.contributor	Gill, William N.
dc.contributor	Martin, Lealon L.
dc.contributor	Gall, Daniel
dc.contributor	Borca-Tasçiuc, Theodorian
dc.contributor.author	Achanta, Ravi S.
dc.date.accessioned	2021-11-03T10:53:10Z
dc.date.available	2021-11-03T10:53:10Z
dc.date.created	2008-01-18T11:10:53Z
dc.date.issued	2008-05
dc.identifier.uri	https://hdl.handle.net/20.500.13015/4044
dc.description	May 2008
dc.description	School of Engineering
dc.language.iso	ENG
dc.publisher	Rensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartof	Rensselaer Theses and Dissertations Online Collection
dc.subject	Chemical and biological engineering
dc.title	Physical-chemical interactions at metal/low-k dielectric interfaces
dc.type	Electronic thesis
dc.type	Thesis
dc.digitool.pid	9664
dc.digitool.pid	9665
dc.digitool.pid	9667
dc.digitool.pid	9666
dc.digitool.pid	9668
dc.rights.holder	This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degree	PhD
dc.relation.department	Dept. of Chemical and Biological Engineering

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