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dc.rights.licenseRestricted to current Rensselaer faculty, staff and students. Access inquiries may be directed to the Rensselaer Research Libraries.
dc.contributorGall, Daniel
dc.contributorPlawsky, Joel L., 1957-
dc.contributorShima, Mutsuhiro
dc.contributorTomozawa, Minoru
dc.contributor.authorPurswani, Jaya Murli
dc.date.accessioned2021-11-03T07:49:20Z
dc.date.available2021-11-03T07:49:20Z
dc.date.created2008-08-08T15:39:18Z
dc.date.issued2008-05
dc.identifier.urihttps://hdl.handle.net/20.500.13015/608
dc.descriptionMay 2008
dc.descriptionSchool of Engineering
dc.descriptionCenter for Integrated Electronics
dc.language.isoENG
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.subjectMaterials science and engineering
dc.titleElectron scattering at copper surfaces
dc.typeElectronic thesis
dc.typeThesis
dc.digitool.pid11885
dc.digitool.pid11886
dc.digitool.pid11888
dc.digitool.pid11887
dc.digitool.pid11889
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
dc.description.degreePhD
dc.relation.departmentDept. of Materials Science and Engineering


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