Show simple item record

dc.rights.licenseRestricted to current Rensselaer faculty, staff and students in accordance with the Rensselaer Standard license. Access inquiries may be directed to the Rensselaer Libraries.
dc.contributorShi, Jian
dc.contributorGall, Daniel
dc.contributor.advisorShi, Sufei
dc.contributor.advisorSundararaman, Ravishankar
dc.contributor.authorRay, Essance, L
dc.date.accessioned2023-09-13T16:07:55Z
dc.date.available2023-09-13T16:07:55Z
dc.date.issued2023-08
dc.identifier.urihttps://hdl.handle.net/20.500.13015/6711
dc.descriptionAugust2023
dc.descriptionSchool of Engineering
dc.description.abstractEngineering the band structure is a technique that is used to modify semiconductors in modern electronic devices. There are two problems that advancement in modern electronics currently faces: miniaturization and specialized processing. A potential solution to these problems is the use of two-dimensional (2D) semiconductors. 2D semiconductors have abundant band structure engineering capabilities that can be exploited in creating more efficient and specific applications. This can be done can be intercalating, straining, defect engineering, substrate engineering, alloying, and heterostructuring. In this thesis, heterostructuring and alloying are used to alter the band structure of InSe and InSe/TMD devices. In project one, InSe alloyed with Sulfur and Tellurium shows a change in bandgap depending on the concentration of the alloy components. In project two, multilayered InSe stacked with bilayer WS2 shows the formation of interlayer excitons that can be further tuned with electronic gating.
dc.languageENG
dc.language.isoen_US
dc.publisherRensselaer Polytechnic Institute, Troy, NY
dc.relation.ispartofRensselaer Theses and Dissertations Online Collection
dc.subjectMaterials engineering
dc.titleEngineering the electronic structure of inse and inse/tmd devices
dc.typeElectronic thesis
dc.typeThesis
dc.date.updated2023-09-13T16:07:57Z
dc.rights.holderThis electronic version is a licensed copy owned by Rensselaer Polytechnic Institute (RPI), Troy, NY. Copyright of original work retained by author.
dc.description.degreeMS
dc.relation.departmentDept. of Materials Science and Engineering


Files in this item

Thumbnail

This item appears in the following Collection(s)

Show simple item record