Water diffusion into silica glass at low temperatures and high pressures and its effect on the chemical durability of glass

Authors
Oehler, Andrea C.
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Other Contributors
Tomozawa, Minoru
Doremus, R. H.
Murarka, S. P.
Watson, Bruce
Issue Date
1995-05
Keywords
Materials engineering
Degree
PhD
Terms of Use
This electronic version is a licensed copy owned by Rensselaer Polytechnic Institute, Troy, NY. Copyright of original work retained by author.
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Abstract
The dissolution rate of silica glass versus water concentration in the glass was measured by mass loss using several types of aqueous solutions; 5% and lO%HF solutions, distilled water and 2N NaOH solution. Increasing the amounts of hydroxyl and molecular water in the glass accelerated the dissolution rate in HF solutions and distilled water. In addition, structural modifications caused by long hydration heat-treatments can also influence the dissolution in HF solutions. For 2N NaOH, it appears that structural changes, caused by hydration heat-treatments prior to etching, increase the dissolution rate of silica glass and the concentration of hydroxyl or molecular water in the glass does not affect the dissolution rate.
Description
May 1995
School of Engineering
Department
Dept. of Materials Engineering
Publisher
Rensselaer Polytechnic Institute, Troy, NY
Relationships
Rensselaer Theses and Dissertations Online Collection
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