Electrophorteic deposition of boron carbide in high aspect ratio trenches in silicon for neutron detector application
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Authors
Rahman, Muktadir
Issue Date
2015-05
Type
Electronic thesis
Thesis
Thesis
Language
ENG
Keywords
Electrical engineering
Alternative Title
Abstract
Electrophoretic Deposition is a colloidal process that utilizes an external electric field to influence charged micro or nanoparticles in a suspension to deposit onto a material surface. It is hypothesized that EPD can be used to fill the high aspect ratio trench-patterned microstructures with boron carbide (B4C) nanoparticles. EPD has been used in the ceramic industry for a long time and recently has found numerous applications due to its low cost, reduced formation time, simple apparatus requirement and versatility in numerous unique applications. It is expected that the fabrication cost of a trench patterned microstructure using wet etching process and filled with B4C nanoparticles through EPD process is significantly lower compared to patterns etched using DRIE and filled through the LPCVD process.
Description
May 2015
School of Engineering
School of Engineering
Full Citation
Publisher
Rensselaer Polytechnic Institute, Troy, NY