Investigation of surface treatment on the electrical interfacial properties of GaN MOS capacitors with Plasma-TEOS and LTO SiO2 as gate dielectrics

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Authors
Tang, Ke
Issue Date
2008-12
Type
Electronic thesis
Thesis
Language
ENG
Keywords
Electrical engineering
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December 2008
School of Engineering
Center for Integrated Electronics
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Rensselaer Polytechnic Institute, Troy, NY
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