Investigation of surface treatment on the electrical interfacial properties of GaN MOS capacitors with Plasma-TEOS and LTO SiO2 as gate dielectrics
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Authors
Tang, Ke
Issue Date
2008-12
Type
Electronic thesis
Thesis
Thesis
Language
ENG
Keywords
Electrical engineering
Alternative Title
Abstract
Description
December 2008
School of Engineering
Center for Integrated Electronics
School of Engineering
Center for Integrated Electronics
Full Citation
Publisher
Rensselaer Polytechnic Institute, Troy, NY